ADVANCED MATERIAL
- Electrowinning of metals – Cu, Ni, Zn, Co, Mn, battery materials from aqueous solution, design, development and commissioning of cells
- Molten salt Electrolysis – Light and refractory metal (Al, Ti, Na), design development of cells, reactor, molten salt circulation, furnaces
- Electrochemical cells electro oxidation, reduction coagulation for effluent treatment, electro-organic synthesis
- Synthesis and production of battery and energy materials – Nickel oxide & Hydroxide, Cobalt oxides, EMD & CMD, Lithium Compounds, Aluminium, Iron Titanium, Nickel, Cobalt & Zinc compounds, allied chemicals used as battery & energy materials.
- Hydrogen production by electrolysis
- Hydrogen production by thermochemical water splitting
- Organic & Electro organic Synthesis
GRAPHENE DERIVATIVE (LN GRPNO)
LN INDTECH has developed several carbon based nano-materials such as Graphene, Graphene oxide and graphene dispersion liquid by exfoliation route. Graphite is a layered material and can be considered as a stack of individual graphene layers. Graphene is produced by reducing exfoliated Graphene Oxide (GO) through advanced dry activation/reduction process. At present we can able to produce 10 kilogram /day. Further augmentation is being done produce 1000 kg/day.
GO has very good mechanical, thermal, optical and chemical properties. GO holds enormous potential for transforming the next generation technologies including electronic gadgets, structural composite & coatings, and anti-corrosion etc. Potential use in electromagnetic shielding applications, conducting inks and anti-bacterial coatings.

Fig 1. (a) Scanning electron microscopy photograph of graphite; (b) Transmission electron spectroscopy of GO and (c) Raman spectroscopy of GO.
Technical Specifications: We can provide different grades of materials as per the customers’ requirement. We are producing different grades of materials with the large varieties of applications and specs are given below;
- Surface area: 300-800 m2/g
- Average diameter of sheet: 0.5 to 20 microns
- Purity: 96% to 98%
- IG/ID: 5 to 20
- Number of layers: 4 to 12

Highpure silicon carbide

Manganese tetroxide

Tin Based Alloys

